In-Situ Metrology for Mesa-Wall Integrity in Large Format Small-Pixel Infrared Detector Array Fabrication
This opportunity funds development and demonstration of a prototype in-situ metrology tool that can quickly and non-destructively screen full wafers for surface damage during fabrication of small-pixel infrared detector arrays. The goal is to assess mesa-wall integrity to improve yield and reliability while supporting rapid, high-throughput manufacturing.
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