Prototype in-situ metrology tool to non-destructively screen surface damage during infrared detector array fabrication
This opportunity supports development of a prototype metrology system that can rapidly, non-destructively perform full-wafer screening for surface damage during fabrication of small-pixel infrared detector arrays. The goal is to assess mesa-wall integrity in large-format devices so manufacturers can improve yield and reduce fabrication defects. A successful project will demonstrate and impleme…
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