Scalable Hard-mask materials with Improved Etch resistance and Low Degradation for Extreme-aspect-Ratio fabrication (SHIELDER)
The SHIELDER opportunity supports the development and demonstration of new hard-mask materials for nanofabrication with much higher plasma etch resistance and low degradation. The goal is to enable scalable patterning of extreme high-aspect-ratio nanoscale structures with high fidelity, smooth sidewalls, and tight dimensional control. It targets fabrication challenges common across semiconduct…
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